Evaluation of the Performance of a Mixture of BF3+H2 from an EH&S Perspective on an Ion Implant Tool
Despres, Joseph*; Jones, Edward; Tang, Ying
(Entegris, Danbury, CT)
In some instances, Semiconductor customers are migrating from the use of neat fluoride dopant sources to the use of gas mixtures to enable better tool productivity. As an example of this trend certain end-users are moving from neat BF3 to a mixture of BF3+H2. The driver for this change is primarily due to the fact that mixtures can provide productivity enhancements in terms of extended source life and/or a higher beam current. While mixtures offer tool productivity benefits, it is also important to the end-user to ensure that there are no adverse EH&S impacts that result from this conversion. This paper explores the results from testing that was performed comparing the amount of hydrogen fluoride (HF) evolution from an Ion Implant tool under various test scenarios. The purpose of the test was to simulate different recipes, such as neat BF3 compared to BF3+H2, along with several venting procedures to identify the effect on the measured HF concentration during a source housing preventative maintenance procedure. The data indicates that the addition of hydrogen does not impact negatively the measured amount of HF that evolves during a source PM under these test conditions. This fact, along with the reliability data of the Entegris VACŪ cylinder package, provides a strong EH&S driver in addition to the increased tool productivity for the use of fluoride mixtures in Ion Implant.